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MLA - Maskless Aligner - Landing

The new Maskless Aligner MLA developed by Heidelberg Instruments. Go Maskless - Achieve More!

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MLA - Maskless Aligner - Landing | mla.himt.de Reviews
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The new Maskless Aligner MLA developed by Heidelberg Instruments. Go Maskless - Achieve More!
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3 Direct Writing
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7 Projection Aligner
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10 Laser Lithography
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MLA - Maskless Aligner - Landing | mla.himt.de Reviews

https://mla.himt.de

The new Maskless Aligner MLA developed by Heidelberg Instruments. Go Maskless - Achieve More!

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MLA - Maskless Aligner - Landing

http://www.mla.himt.de/index.php

This is what our MLA Users say:. Valentin Flauraud, EPFL LMIS1, Lausanne. Besides the obvious time advantage of direct patterning, the very high resolution alignment offered by the MLA is a clear advantage over our traditional lithography line. With alignment accuracy repeatably in the few hundred nanometres, high resolution multiple patterning and seamless mix and match with our electron beam lithography tool is now possible. Andreas Fleischmann, Kirchhoff Institute of Physics, Heidelberg.

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MLA150 - Home

http://www.himt.de/index.php/MLA150.html

DWL 2000 / 4000. VPG Small Area Systems. VPG Large Area Systems. Lithography for special substrates. Large Area Stage Systems. Process and Application Lab. The MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have gathered in the past 30 years. Experience the flexibility that the MLA150 Maskless Aligner will provide and expose your layout directly to accelerate your work in the areas of Life Science.

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MLA100 - Home

http://www.himt.de/index.php/MLA100.html

DWL 2000 / 4000. VPG Small Area Systems. VPG Large Area Systems. Lithography for special substrates. Large Area Stage Systems. Process and Application Lab. Applications for the MLA100 include Life Science. Sensors, Actuators, MOEMS, Material Research, Nano-Tubes, Graphene, and any other application that requires microstructures. For additional information please download. The Fact Sheet or contact. Write speed of 50 mm /min. Substrates up to 6" x 6". Exposure area of 100 x 100 mm. Structures down to 1 µm.

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MLA - Maskless Aligner - Landing

This is what our MLA Users say:. Valentin Flauraud, EPFL LMIS1, Lausanne. Besides the obvious time advantage of direct patterning, the very high resolution alignment offered by the MLA is a clear advantage over our traditional lithography line. With alignment accuracy repeatably in the few hundred nanometres, high resolution multiple patterning and seamless mix and match with our electron beam lithography tool is now possible. Andreas Fleischmann, Kirchhoff Institute of Physics, Heidelberg.

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